Applied ComPLUS 4T Inspection is a Darkfield wafer inspection system that performs high-speed defect and process monitoring for 65nm production. Using dual-angle illumination, a proprietary enlarged GrayField technology, and advanced noise suppression techniques, ComPLUS 4T detects a broad range of defects at production throughput with 20% higher capture rate on critical defects, enabling faster ramp and higher production yield.

Based on the field proven Compass platform, the ComPLUS 4T system transcends the boundaries of traditional Darkfield and Brightfield inspection, covering the widest optical inspection spectrum with one platform. The system delivers exceptional advantages in sensitivity and throughput, translating to significant savings to chipmakers who typically purchase multiple specialized inspection tools to cover the same range of applications.

ComPLUS 4T’s innovative optical design and state-of-the-art image processing capability have been proven to double the throughput while improving inspection sensitivity. Combined with easy recipe set-up, ComPLUS 4T allows chipmakers to execute the optimal wafer sampling plan in foundry or IDM production environment. Efficient nuisance filtering and on-the-fly (OTF) defect grouping allow process excursion control based on defect-of-interest, accelerating defect resolution. Seamless connectivity between ComPLUS 4T and SEMVision defect review systems eases information transfer between the two, and also allows inspection recipe tuning on the review system, dramatically improving productivity of both the inspection and the review systems.

ComPLUS 4T is part of Applied Materials’ Resolution strategy to lead the metrology and inspection market with continuous advances in absolute resolution, root cause, process response and cost per resolution.